The DST3 is equipped with a large chamber
(300 mm diameter)
and three 2â€ diameter water cooled cathodes which make it suitable
for long time deposition.
The magnetron desk sputter coater is equipped with RF and DC power supplies.
It can sputter semiconductors, dielectrics and metal (oxidizing & noble) targets.
The system is equipped with an auto adjustable matching box,
minimizing the reflected power in the RF sputtering.
For increasing film adhesion to the substrate and to improve the film structures,
a 300 V, DC bias voltage can be applied to the substrate (optional).